ChemicalBook Product Catalog Chemical Reagents Silane reagent TRI-T-BUTOXYSILANOL

TRI-T-BUTOXYSILANOL

TRI-T-BUTOXYSILANOL Basic information
Uses
Product Name:TRI-T-BUTOXYSILANOL
Synonyms:TRI-T-BUTOXYSILANOL;TRIS(TERT-BUTOXY)SILANOL;TRIS(T-BUTOXY)SILANOL;Tri-tert-butoxysilanol;Tri-tert-butyl hydrogen orthosilicate;Tri-t-butoxysilanol (99.999%-Si) PURATREM;Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 Ml Swagelokcylinder (96-1077) for CVD/ALD;Tris(tert-butoxy)silanol 99.999%
CAS:18166-43-3
MF:C12H28O4Si
MW:264.43
EINECS:
Product Categories:Micro/Nanoelectronics;Organosilicon;Precursors by Metal;Precursors Packaged for Deposition SystemsOrganometallic Reagents;SilanolsVapor Deposition Precursors;Vapor Deposition Precursors;14: Silicon;Chemical Synthesis;CVD and ALD Precursors by Metal;CVD and ALD Precursors Packaged for Deposition Systems;Materials Science;Organometallic Reagents;Silanols;Silicon;Vapor Deposition Precursors;Silanes;Solution Deposition Precursors
Mol File:18166-43-3.mol
TRI-T-BUTOXYSILANOL Structure
TRI-T-BUTOXYSILANOL Chemical Properties
Melting point 63-65 °C(lit.)
Boiling point 205-210 °C(lit.)
density 0,92 g/cm3
Fp >65°C
storage temp. Inert atmosphere,Room Temperature
form solid
pka11.78±0.53(Predicted)
Hydrolytic Sensitivity7: reacts slowly with moisture/water
Sensitive moisture sensitive
Safety Information
Risk Statements 36/37/38
Safety Statements 22-24/25
WGK Germany 3
TSCA No
MSDS Information
ProviderLanguage
SigmaAldrich English
TRI-T-BUTOXYSILANOL Usage And Synthesis
UsesSilicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.
UsesTris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.
UsesPrecursors Packaged for Depositions Systems
General DescriptionTris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.
TRI-T-BUTOXYSILANOL Preparation Products And Raw materials
Raw materialsDi-tert-butoxydichlorosilane.-->TRI-T-BUTOXYCHLOROSILANE-->Water-->Sodium tert-butoxide-->tert-Butanol-->Isobutylene
Preparation ProductsTetrahydrofuran
SILICON TETRA-T-BUTOXID TRIS(ISOPROPOXY)SILANOL TRI-T-BUTOXYSILANOL TRIS(TERT-PENTOXY)SILANOL TRIISOPROPOXYSILANE
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